Precision Cleaning
We provide precision cleaning of semiconductor process components tailored to ETCH, CVD, Diff, and IMP process characteristics — removing contaminants and residue to extend part life and improve process stability.
PROCESS 01
ETCH
- Lower / Upper Liner
- Liner MESA · C3 Screen
- SiC Shower Head
- CATHODE SLEEVE
- Bottom Ring · LID
- HUB MESA Gas Injector
PROCESS 02
CVD
- Gas Box Dome · Face Plate
- Gas Box Dome Heater
- Vector Bellows · Sin Mixing Bowl
- Spindle Plate · Vac Valve
- Heater Bellows · Lift Bellows
- Shower Head · Chiller Plate
PROCESS 03
Diff
- DPN Dome · EPI Chamber
- End Plate · Susceptor
- Elbow · Line Vac Exh
- VAC Line · Flange
- Bellows · TEOS Trap
- Upper Dome · Six Arm
PROCESS 04
IMP
- ASS'Y Ion Sources
- Manipulator Assy
- V4 Valve HCP · Trap Pack
- ASS'Y PEF · RED BUSUING
- Top Cover · Corona Ring
- TP1 Bellows · VAC Blade
Cleaning Cases · Before / After
ETCH · Liner / Plate
Shower Head / Screen
Diff · Flange / Elbow